Pierre-Yves Tessier

Institut des Matériaux Jean Rouxel, France 0000-0001-5361-7037

Pierre-Yves Tessier was born in Le Mans, France, in 1959. He received his Engineering degree in 1982 from INSA, the National Institute for Applied Sciences, in Rennes, France, and the Ph.D. degree from the University of Rennes in 1987. He worked as Assistant Professor at the “Institut Universitaire de Technologie” of the University of Paris XI – Orsay, France in charge of the vacuum and thin film laboratory for technical training. He has taught since 2000 as Senior Lecturer at Polytech’Nantes, the graduate school of engineering of the University of Nantes, a French polytechnic engineering university. He has worked as Researcher since 1992 at the Institute of Materials at Nantes, “Institut des matériaux Jean Rouxel – IMN - CNRS”, in the plasma group. His research is related to cold plasma processes for etching and thin film deposition. His current research is focused on the use of plasmas for nano- and microtechnology. He has developed ionized physical vapor deposition IPVD based on inductive coupled plasma magnetron sputtering for stress engineering in micro and nanotechnology. He was in charge of the PVD team from 1999 to 2003 and was responsible for the thin films for microsystems and microsensors activity in the plasma group of the laboratory. His recent research is focused on carbon-based material and nanocomposites thin films deposited by hybrid techniques combining magnetron sputtering and plasma-enhanced chemical vapour deposition. He authored or coauthored 45 papers in international peer-reviewed publications and about 80 communications.

Biography Updated on 15 March 2011

Scholarly Contributions [Data Provided by scopus]

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