Dao Hua Zhang

Dao Hua Zhang received the M.S. degree from Shandong University, China, and the Ph.D. degree from the University of New South Wales, Australia. He joined the School of Electrical and Electronic Engineering, Nanyang Technological University, as a Lecturer in 1991 and was promoted to a Senior Lecturer in 1995 and an Associate Professor in 1999. He has authored and coauthored over 220 journal and conference papers and filed 3 patents. He is a Senior Member of IEEE since 1997 and a Fellow of the Institute of Physics since 2006.

Biography Updated on 27 August 2007

Personal Home Page

http://www.ntu.edu.sg/eee/eee6/cv/edhzhang.htm

Articles in Scholarly Journals [Incomplete List]

  1. Modeling of intersubband transitions in quantum well infrared photodetectors with complex potential profiles
    Optical and Quantum Electronics, vol. 38, no. 12-14, pp. 1101–1106, 2007
  2. Normal incidence silicon doped p-type GaAs/AlGaAs quantum-well infrared photodetector on (111)A substrate
    Infrared Physics & Technology, vol. 50, no. 2-3, pp. 119–123, 2007
  3. Interdiffusion effect on GaAsSbN/GaAs quantum well structure studied by 10-band k•p model
    Thin Solid Films, vol. 515, no. 10, pp. 4435–4440, 2007
  4. 1.31 µm GaAs-based heterojunction p–i–n photodetectors using InGaAsNSb as the intrinsic layer grown by molecular beam epitaxy
    Thin Solid Films, vol. 515, no. 10, pp. 4441–4444, 2007
  5. InGaAsP/InP long wavelength quantum well infrared photodetectors
    Thin Solid Films, vol. 515, no. 10, pp. 4450–4453, 2007
  6. Theoretical study of quantum well infrared photodetectors with asymmetric well and barrier structures for broadband photodetection
    Journal of Applied Physics, vol. 101, no. 3, p. 033114, 2007
  7. Interdiffusion in narrow InGaAsN/GaAs quantum wells
    Journal of Applied Physics, vol. 101, no. 10, p. 103111, 2007
  8. GaInNAs double-barrier quantum well infrared photodetector with the photodetection at 1.24 µm
    Applied Physics Letters, vol. 91, no. 5, p. 051102, 2007
  9. Band structure investigation of strained Si1-xGex/Si coupled quantum wells
    International Journal of Nanotechnology, vol. 4, no. 4, p. 431, 2007
  10. Transverse electric dominant intersubband absorption in Si-doped GaInAsN/GaAs quantum wells
    Journal of Applied Physics, vol. 99, no. 4, p. 043514, 2006
  11. Study of the interdiffusion effect on the band structures of Si[sub 1-x]Ge[sub x]/Si quantum wells
    Journal of Applied Physics, vol. 99, no. 7, p. 076108, 2006
  12. Bound electrical charges in BaTiO_{3} ferroelectric thin films: Evidence for spontaneous polarization
    Physical Review B, vol. 73, no. 21, 2006
  13. Optical magnetic response from parallel plate metamaterials
    Physical Review B, vol. 74, no. 19, 2006
  14. Ta/SiCN bilayer barrier for Cu–ultra low k integration
    Thin Solid Films, vol. 504, no. 1-2, pp. 235–238, 2006
  15. Comparative investigation of TaN and SiCN barrier layer for Cu/ultra low k integration
    Thin Solid Films, vol. 504, no. 1-2, pp. 265–268, 2006
  16. Infrared absorption and current–voltage characteristic of GaAs/AlGaAs multiple quantum wells on GaAs (111)A substrate grown by solid source molecular beam epitaxy
    Journal of Crystal Growth, vol. 288, no. 1, pp. 36–39, 2006
  17. Investigation of N incorporation in InGaAs and GaAs epilayers on GaAs using solid source molecular beam epitaxy
    Journal of Crystal Growth, vol. 275, no. 3-4, pp. 440–447, 2005
  18. Metal?organic chemical vapor deposited copper interconnects for deep submicron integrated circuits
    Thin Solid Films, vol. 471, no. 1-2, pp. 270–272, 2005
  19. Characterizations of InzGa1-z As1-x-yN xSby P-i-N structures grown on GaAs by molecular beam epitaxy
    Journal of Materials Science: Materials in Electronics, vol. 16, no. 5, pp. 301–307, 2005
  20. Study of interdiffusion in GaInNAs/GaAs quantum well structure emitting at 1.3 µm by eight-band k·p method
    Journal of Applied Physics, vol. 97, no. 10, p. 103718, 2005
  21. Study of interdiffusion in GaAsSbN/GaAs quantum well structure by ten-band k·p method
    Journal of Applied Physics, vol. 98, no. 2, p. 026102, 2005
  22. Growth of p-type GaAs/AlGaAs(111) quantum well infrared photodetector using solid source molecular-beam epitaxy
    Journal of Applied Physics, vol. 98, no. 5, p. 054905, 2005
  23. GaAs-Based Heterojunction p-i-n Photodetectors Using Pentanary InGaAsNSb as the Intrinsic Layer
    IEEE Photonics Technology Letters, vol. 17, no. 9, pp. 1932–1934, 2005
  24. International Journal of Nanoscience, vol. 3, no. 4 & 5, p. 471, 2004
  25. International Journal of Nanoscience, vol. 3, no. 4 & 5, p. 481, 2004
  26. Improving electrical performance of Cu/porous ultra-low k dielectrics single damascene lines
    Electronics Letters, vol. 40, no. 12, p. 729, 2004
  27. Doping effect on the intermixing in GaInAsP/InP multiple quantum well structures grown using all solid sources
    Journal of Crystal Growth, vol. 268, no. 3-4, pp. 401–405, 2004
  28. Study of interactions between ?-Ta films and SiO2 under rapid thermal annealing
    Thin Solid Films, vol. 462-463, pp. 279–283, 2004
  29. Thermal stability of Cu/?-Ta/SiO2/Si structures
    Thin Solid Films, vol. 462-463, pp. 284–287, 2004
  30. Comparative study of argon and hydrogen/helium plasma treatments on the properties of Cu/SiLK damascene structures for interconnect technology
    Thin Solid Films, vol. 462-463, pp. 172–175, 2004
  31. Comparative study of Ta, TaN and Ta/TaN bi-layer barriers for Cu-ultra low-k porous polymer integration
    Thin Solid Films, vol. 462-463, pp. 176–181, 2004
  32. Characterization of Cu/Ta/ultra low-k porous polymer structures for multilevel interconnects
    Thin Solid Films, vol. 462-463, pp. 182–185, 2004
  33. Barrier layer effects on reliabilities of copper metallization
    Thin Solid Films, vol. 462-463, pp. 288–291, 2004
  34. Study of copper diffusion into Ta and TaN barrier materials for MOS devices
    Thin Solid Films, vol. 462-463, pp. 240–244, 2004
  35. A new method for deposition of cubic Ta diffusion barrier for Cu metallization
    Thin Solid Films, vol. 434, no. 1-2, pp. 126–129, 2003
  36. Oxidation behavior of CNTs and the electric double layer capacitor made of the CNT electrodes
    Science in China Series E, vol. 46, no. 4, p. 349, 2003
  37. Study of InGaAsP/InP multiple quantum wells grown by solid source molecular beam epitaxy
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 21, no. 4, p. 1940, 2003
  38. Electrooptic polymer modulators with an inverted-rib waveguide structure
    IEEE Photonics Technology Letters, vol. 15, no. 2, pp. 218–220, 2003
  39. International Journal of Modern Physics B [Condensed Matter Physics; Statistical Physics; Applied Physics], vol. 16, no. 1 & 2, p. 100, 2002
  40. Barrier-free direct-contact-via (DCV) structures for copper interconnects
    Electronics Letters, vol. 38, no. 18, p. 1026, 2002
  41. Compressively strained p-type InGaAs/AlGaAs quantum-well infrared photodetectors
    Journal of Applied Physics, vol. 92, no. 10, p. 6287, 2002
  42. Strained GaInAsP/InP multiple quantum well structures grown by solid source molecular beam epitaxy
    Journal of Crystal Growth, vol. 245, no. 1-2, pp. 9–14, 2002
  43. High-resolution X-ray diffraction study of strained InGaAsP/InP multiple quantum well structures grown using all solid sources
    Materials Science in Semiconductor Processing, vol. 4, no. 6, pp. 631–636, 2001
  44. Comparative Study of Ionized Metal Plasma Ta, TaN and Multistacked Ta/TaN Structure as Diffusion Barriers for Cu Metallization
    Surface Review and Letters, vol. 8, no. 5, pp. 459–464, 2001
  45. Surface and Structural Properties of Copper Films Deposited by Metal Organic Chemical Vapor Deposition for Si Technology
    Surface Review and Letters, vol. 8, no. 5, pp. 533–536, 2001
  46. Study of Cu Diffusion in Cu/TaN/SiO2/Si Multilayer Structures
    Surface Review and Letters, vol. 8, no. 5, pp. 527–532, 2001
  47. Interfacial Property of the Pseudomorphic InGaAs/AlGaAs Multiple Quantum Wells
    Surface Review and Letters, vol. 8, no. 5, pp. 537–540, 2001
  48. Effect of a thin ionized-metal-plasma deposited Cu layer on the properties and thermal stability of Cu-TaN-SiO/sub 2/-Si structures
    IEEE Transactions on Device and Materials Reliability, vol. 1, no. 4, pp. 174–178, 2001
  49. Growth of SiCN films by magnetron sputtering
    Surface Engineering, vol. 16, no. 3, pp. 225–228, 2000
  50. GaInAsP grown on GaAs substrate by solid source molecular beam epitaxy with a valve phosphorous cracker cell
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 18, no. 4, p. 2274, 2000
  51. Optical properties of p-type InGaAs/AlGaAs multiple quantum well structures
    Microelectronic Engineering, vol. 51-52, no. 1-4, pp. 181–187, 2000
  52. Schottky contacts on wide bandgap InGaP grown with phosphorous cracker cells and their thermal reliability
    Materials Science and Engineering B, vol. 74, no. 1-3, pp. 143–146, 2000
  53. Physical properties of InGaAsP/InP grown by molecular beam epitaxy with valve phosphorous cracker cell
    Journal of Crystal Growth, vol. 211, no. 1-4, pp. 384–388, 2000
  54. Effects of phosphorous beam equivalent pressure on GaInAsP/GaAs grown by solid source molecular beam epitaxy with a valve phosphorous cracker cell
    Journal of Crystal Growth, vol. 210, no. 4, pp. 458–462, 2000
  55. Influence of silane partial pressure on the properties of amorphous SiCN films prepared by ECR-CVD
    Thin Solid Films, vol. 377-378, no. 1-2, pp. 607–610, 2000
  56. Effects of nitrogen fraction on the structure of amorphous silicon–carbon–nitrogen alloys
    Thin Solid Films, vol. 377-378, no. 1-2, pp. 562–566, 2000
  57. Intersubband absorption from InGaAlAs/InAlAs multiple quantum-well structures grown by molecular-beam epitaxy
    Applied Physics Letters, vol. 76, no. 24, p. 3579, 2000
  58. Six-band k·p approach to the effects of doping on energy dispersion in p-type strained In/sub 0.15/Ga/sub 0.85/As-Al/sub 0.33/Ga/sub 0.67/As quantum-well structures
    IEEE Journal of Quantum Electronics, vol. 36, no. 7, pp. 835–841, 2000
  59. Effect of Be doping on the absorption of InGaAs/AlGaAs strained quantum-well infrared photodetectors grown by molecular-beam epitaxy
    Applied Physics Letters, vol. 74, no. 11, p. 1570, 1999
  60. Effects of arsenic beam equivalent pressure on InGaAsP grown by solid source molecular beam epitaxy with continuous white phosphorous production
    Journal of Crystal Growth, vol. 197, no. 1-2, pp. 89–94, 1999
  61. Characterisation of p-doped InGaAs/AlGaAs quantum wells for infrared photodetector application
    Journal of Crystal Growth, vol. 198-199, pp. 1141–1145, 1999
  62. Metal contacts to n-type AlGaAs grown by molecular beam epitaxy
    Materials Science and Engineering B, vol. 60, no. 3, pp. 189–193, 1999
  63. Low threshold current vertical-cavity surface-emitting lasers grown at a fixed temperature
    Microelectronic Engineering, vol. 43-44, pp. 533–537, 1998
  64. Dark current and infrared absorption of p-doped InGaAs/AlGaAs strained quantum wells
    Applied Physics Letters, vol. 73, no. 8, p. 1095, 1998
  65. Carbon incorporation in GaAs/Al0.2Ga0.8As triple quantum wells and its effect on laser performance
    Superlattices and Microstructures, vol. 24, no. 2, pp. 119–125, 1998
  66. Influence of substrate misorientation on quality of active region and performance of GaAs/AlGaAs triple-quantum-well lasers grown by molecular beam epitaxy
    Journal of Crystal Growth, vol. 181, no. 1-2, pp. 1–8, 1997
  67. Photoluminescence and dark current of p-doped InGaAs/AlxGa1-xAs strained multiple quantum wells
    Superlattices and Microstructures, vol. 20, no. 1, pp. 105–110, 1996
  68. Effects of As cell temperature on oval defect density and C acceptor concentration of light Si-doped GaAs grown by molecular beam epitaxy
    Journal of Crystal Growth, vol. 165, no. 1-2, pp. 15–18, 1996
  69. Sequential tunneling through n-type GaAs/AlGaAs multi-quantum-well structures with Schottky and ohmic contacts
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 13, no. 1, p. 4, 1995
  70. Photoluminescence in degenerate p-type GaAs layers grown by molecular beam epitaxy
    Materials Science and Engineering B, vol. 35, no. 1-3, pp. 449–453, 1995
  71. Space charge buildup in tight-binding superlattices induced by electron sequential tunneling
    Superlattices and Microstructures, vol. 18, no. 2, pp. 83–90, 1995
  72. Characterization of beryllium-doped molecular beam epitaxial grown GaAs by photoluminescence
    Journal of Crystal Growth, vol. 148, no. 1-2, pp. 35–40, 1995
  73. The effect of As/Ga flux ratio on Si-doped GaAs layers grown by molecular beam epitaxy
    Journal of Crystal Growth, vol. 135, no. 3-4, pp. 441–446, 1994
  74. Photoluminescence, intersubband absorption, and double crystal x-ray diffraction in p-doped InGaAs/AlGaAs strained multiple quantum wells
    Applied Physics Letters, vol. 65, no. 11, p. 1430, 1994
  75. Photoluminescence studies of strained InxGa1-xAs-Al0.28Ga0.72As heterostructures grown by molecular-beam epitaxy
    Journal of Applied Physics, vol. 76, no. 1, p. 246, 1994
  76. The effect of growth interruption on the photoluminescence linewidth of GaAs/InGaAs quantum wells grown by molecular beam epitaxy
    Journal of Crystal Growth, vol. 131, no. 1-2, pp. 1–4, 1993
  77. Investigation of Persistent Photoconductivity from Compensated Amorphous Hydrogenated Silicon
    Japanese Journal of Applied Physics, vol. 32, no. Part 1, No. 2, pp. 722–725, 1993
  78. Metal contacts on amorphous hydrogenated silicon: effects of annealing
    Thin Solid Films, vol. 208, no. 1, pp. 87–90, 1992
  79. Conductivity and defects in amorphous silicon doping modulated multilayers
    Thin Solid Films, vol. 198, no. 1-2, pp. 43–51, 1991
  80. Fluorinated hydrogenated silicon films
    Thin Solid Films, vol. 186, no. 2, pp. L47–L50, 1990
  81. Special conductivity effects in amorphous hydrogenated silicon
    Applied Surface Science, vol. 33-34, pp. 692–704, 1988