Christina A. Hacker
Christina A. Hacker is a Research Chemist at the Semiconductor Electronics Division at the National Institute of Standards and Technology, Gaithersburg, Md, USA. She joined NIST in 2002 as a National Research Council (NRC) Postdoctoral Fellow. Her work investigates the formation and characterization of monolayers on semiconductors for molecular electronics applications. In addition to developing new measurement techniques, such as p-polarized backside reflection absorption infrared spectroscopy to investigate buried electronic layers, Hacker has also been instrumental in developing a novel fabrication technique, flip-chip lamination, which is promising for many next generation electronic structures, including molecular electronics. Hacker received her Ph.D. degree in analytical chemistry in 2002 from the University of Wisconsin-Madison studying optical measurements of the electronic interaction of molecular films on silicon surfaces in UHV. Since joining NIST, she has investigated the chemical and physical properties of many molecular monolayers on both metal and semiconductor surfaces and continues to be one of the world's experts in molecular layers on silicon. Hacker's general research interests include chemical, physical, and electronic properties of organic monolayers for molecular electronics; utilization of molecular electronics, nanoelectronics, and interface engineering; surface and interface chemistry including interface modification and surface-sensitive analytical techniques.
Biography Updated on 5 September 2011