Avanish K. Srivastava

Dr. Avanish Kumar Srivastava did Ph.D. at I.I.Sc. Bangalore, M.Tech. at I.I.T. Kanpur, M.Sc. at I.I.T. Roorkee. He is working in the field of processing and characterization of various metallic systems, composites, semiconductors and oxide nanostructures. He has collaborations with Prof. S.Ranganathan (I.I.Sc., Bangalore, India), Prof. S.N.Ojha (B.H.U., Varanasi, India), Prof. C. Colliex (University of Paris, France), Prof. K.Y.Zhang (University of Reims, France), Prof. H. Fuess & Prof. H.-J. Kleebe (Technical University Darmstadt, Germany) and Prof. H.A.Naseem (University of Arkansas, USA), on synthesis, evaluation and basic understanding of variety of materials. He is recepient of BOYSCAST fellowship (Govt. of India) and Kwan Im Thong Hood Fellowship of Singapore. He has several publications in journals like NanoLetters, Nanotechnology, Acta Materialia, J.Electrochemical Society, Electrochem Solid State Lett., J.Phys.D Appl. Phys., etc.. He organized the 27th Conference on Electron Microscopy and Allied Fields (EMSI-2004) held at New Delhi. He has served as the member of International Advisory Board of 8th Asia Pacific Conference on Electron Microscopy (Japan, 2004). He is Member of Indo-French Technical Association. His prolific research in Electron Microscopy, applied for understanding the nucleation-growth mechanisms and phase transformations in nanostructured semiconducting materials is outstanding and known by his peers world-wide. His most exciting experimental research activity on, in-situ annealing experiment under electron beam on interfacial diffusion of aluminium into amorphous Si leading to metal induced heterogeneous Si-crystallization, has enlighten the dynamic process in reality. Recently he reported two crystal structures in polymer-tungsten oxide. He also reported, first time, the direct evidence of electron beam induced nano-scaled transformations in zinc oxide.

Biography Updated on 18 December 2008

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