Franco Cerrina

Personal Home Page

http://www.engr.wisc.edu/ece/faculty/cerrina_francesco.html

Articles in Scholarly Journals [Incomplete List]

  1. Extreme ultraviolet holographic lithography: Initial results
    Applied Physics Letters, vol. 90, no. 2, p. 023116, 2007
  2. Local line edge roughness in microphotonic devices: An electron-beam lithography study
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 25, no. 1, p. 235, 2007
  3. The con-focal method on verifying focal plane of MAS machine
    Optics Express, vol. 15, no. 3, p. 872, 2007
  4. Corrigendum
    Nucleic Acids Research, vol. 35, no. 2, pp. 703–703, 2006
  5. A scalable method for multiplex LED-controlled synthesis of DNA in capillaries
    Nucleic Acids Research, vol. 34, no. 16, pp. e110–e110, 2006
  6. Organic Letters, vol. 8, no. 11, pp. 2357–2360, 2006
  7. Progress in gene assembly from a MAS-driven DNA microarray
    Microelectronic Engineering, vol. 83, no. 4-9, pp. 1613–1616, 2006
  8. High performance resist for EUV lithography
    Microelectronic Engineering, vol. 77, no. 1, pp. 27–35, 2005
  9. Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 23, no. 1, p. 138, 2005
  10. Effect of a surface inhibition layer on line edge roughness
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 23, no. 3, p. 1096, 2005
  11. Development, installation, and performance of the x-ray stepper JSAL 5C
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 23, no. 6, p. 2896, 2005
  12. Amplification and assembly of chip-eluted DNA (AACED): a method for high-throughput gene synthesis
    Nucleic Acids Research, vol. 32, no. 17, pp. 5011–5018, 2004
  13. Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 22, no. 1, p. 99, 2004
  14. Minimal zone plates for x-ray lithography
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 22, no. 6, p. 3570, 2004
  15. Modeling, fabrication, and experimental application of clear x-ray phase masks
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 22, no. 6, p. 3575, 2004
  16. Biological lithography: Improvements in DNA synthesis methods
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 22, no. 6, p. 3163, 2004
  17. Journal of the American Chemical Society, vol. 126, no. 51, pp. 16704–16705, 2004
  18. Modeling Clear Phase-Mask Materials for Sub-50 nm X-Ray Application
    Japanese Journal of Applied Physics, vol. 43, no. No. 6B, pp. 3722–3727, 2004
  19. A comment on `A new ray-tracing program RIGTRACE for X-ray optical systems' [J. Synchrotron Rad. (2001), 8, 1047–1050]
    Journal of Synchrotron Radiation, vol. 10, no. 2, pp. 191–192, 2003
  20. Sub-50 nm period patterns with EUV interference lithography
    Microelectronic Engineering, vol. 67-68, pp. 56–62, 2003
  21. High sensitivity nanocomposite resists for EUV lithography
    Microelectronic Engineering, vol. 65, no. 4, pp. 454–462, 2003
  22. Line edge roughness and photoresist percolation development model
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 21, no. 1, p. 112, 2003
  23. Line edge roughness of sub-100 nm dense and isolated features: Experimental study
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 21, no. 6, p. 3124, 2003
  24. Stochastic modeling of high energy lithographies
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 21, no. 6, p. 3166, 2003
  25. DNA microarrays: An imaging study
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 21, no. 6, p. 2946, 2003
  26. Biological lithography: development of a maskless microarray synthesizer for DNA chips
    Microelectronic Engineering, vol. 61-62, no. 1-3, pp. 33–40, 2002
  27. Four-wave EUV interference lithography
    Microelectronic Engineering, vol. 61-62, no. 1-3, pp. 77–82, 2002
  28. Gene Expression Analysis Using Oligonucleotide Arrays Produced by Maskless Photolithography
    Genome Research, vol. 12, no. 11, pp. 1749–1755, 2002
  29. Bright peak enhanced x-ray clear phase mask
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 20, no. 1, p. 250, 2002
  30. Multiple-beam interference lithography with electron beam written gratings
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 20, no. 6, p. 2844, 2002
  31. Comprehensive model of electron energy deposition
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 20, no. 6, p. 2666, 2002
  32. Depth dependence of resist line-edge roughness: Relation to photoacid diffusion length
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 20, no. 6, p. 2927, 2002
  33. Focusing x-ray masks for printing very narrow features
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 19, no. 6, p. 2434, 2001
  34. Technique for 25 nm x-ray nanolithography
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 19, no. 6, p. 2428, 2001
  35. Can proximity x-ray lithography print 35 nm features? Yes
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 19, no. 6, p. 2423, 2001
  36. Resist line edge roughness and aerial image contrast
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 19, no. 6, p. 2890, 2001
  37. Observation of speckle patterns in extreme ultraviolet imaging
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 19, no. 6, p. 2406, 2001
  38. Elastic strain relief in nitridated Ga metal buffer layers for epitaxial GaN growth
    Applied Physics Letters, vol. 78, no. 7, p. 895, 2001
  39. Oriented crystallization of GaSb on a patterned, amorphous Si substrate
    Applied Physics Letters, vol. 78, no. 10, p. 1358, 2001
  40. Fabrication of ultralow-loss Si/SiO2 waveguides by roughness reduction
    Optics Letters, vol. 26, no. 23, p. 1888, 2001
  41. Energy transfer between electrons and photoresist: Its relation to resolution
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 18, no. 6, p. 3297, 2000
  42. Macromolecules, vol. 33, no. 26, pp. 9575–9582, 2000
  43. X-ray microdiffraction study of Cu interconnects
    Applied Physics Letters, vol. 76, no. 3, p. 315, 2000
  44. Journal of Physics D: Applied Physics, vol. 33, no. 12, pp. R103–R116, 2000
  45. Image formation in EUV lithography: Multilayer and resist properties
    Microelectronic Engineering, vol. 53, no. 1-4, pp. 13–20, 2000
  46. Computation of reflected images from EUV masks
    Microelectronic Engineering, vol. 46, no. 1-4, pp. 443–447, 1999
  47. Overlay budget analysis for the 100 nm device generation
    Microelectronic Engineering, vol. 46, no. 1-4, pp. 457–460, 1999
  48. Use of photoelectron microscopes as X-ray detectors for imaging and other applications
    Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, vol. 437, no. 2-3, pp. 516–520, 1999
  49. A spectromicroscopy study of the Al/GaS interface: evidence of band bending lateral inhomogeneities
    Journal of Electron Spectroscopy and Related Phenomena, vol. 101-103, no. 1-3, pp. 671–675, 1999
  50. Measurement of strain in Al–Cu interconnect lines with x-ray microdiffraction
    Journal of Applied Physics, vol. 86, no. 2, p. 884, 1999
  51. Nature Biotechnology, vol. 17, no. 10, pp. 974–978, 1999
  52. An x-ray spectromicroscopic study of electromigration in patterned Al(Cu) lines
    Applied Physics Letters, vol. 74, no. 1, p. 22, 1999
  53. Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography
    Applied Physics Letters, vol. 75, no. 15, p. 2328, 1999
  54. Nanometer focusing of hard x rays by phase zone plates
    Review of Scientific Instruments, vol. 70, no. 5, p. 2238, 1999
  55. Development of zone plates with a blazed profile for hard x-ray applications
    Review of Scientific Instruments, vol. 70, no. 9, p. 3537, 1999
  56. Image formation in extreme ultraviolet lithography and numerical aperture effects
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 17, no. 6, p. 2992, 1999
  57. Nanolithography using extreme ultraviolet lithography interferometry: 19 nm lines and spaces
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 17, no. 6, p. 3052, 1999
  58. Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 17, no. 6, p. 3345, 1999
  59. Extreme ultraviolet and x-ray resist: Comparison study
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 17, no. 6, p. 3379, 1999
  60. Extension of x-ray lithography to 50 nm with a harder spectrum
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 17, no. 6, p. 3426, 1999
  61. Pattern resolution of an x-ray beamline with a wide exposure field
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 17, no. 6, p. 3433, 1999
  62. Mechanical characterization of electron-beam resist using micromachined structures
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 17, no. 6, p. 2719, 1999
  63. Process dependence of roughness in a positive-tone chemically amplified resist
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 16, no. 6, p. 3748, 1998
  64. Imaging properties of the extreme ultraviolet mask
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 16, no. 6, p. 3444, 1998
  65. Aspheric collimator for a point source x-ray lithography system
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 16, no. 6, p. 3456, 1998
  66. Soft-x-ray transmission photoelectron spectromicroscopy with the MEPHISTO system
    Review of Scientific Instruments, vol. 69, no. 9, p. 3106, 1998
  67. Investigation of mask pattern proximity correction to reduce image shortening in X-ray lithography
    Microelectronic Engineering, vol. 41-42, pp. 271–274, 1998
  68. X-ray mask distortions during e-beam patterning
    Microelectronic Engineering, vol. 41-42, pp. 283–286, 1998
  69. Prediction of in-plane distortions due to mask fabrication processes
    Microelectronic Engineering, vol. 35, no. 1-4, pp. 549–552, 1997
  70. X-ray mask temperature distribution and magnification control
    Microelectronic Engineering, vol. 35, no. 1-4, pp. 561–563, 1997
  71. An x-ray spectromicroscopic study of the local structure of patterned titanium silicide
    Applied Physics Letters, vol. 71, no. 1, p. 55, 1997
  72. Synchrotron radiation micro-Fourier transform infrared spectroscopy applied to photoresist imaging
    Applied Physics Letters, vol. 71, no. 6, p. 847, 1997
  73. Application of X-rays to nanolithography
    Proceedings of the IEEE, vol. 85, no. 4, pp. 644–651, 1997
  74. Automatic mask generation in x-ray lithography
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 15, no. 6, p. 2238, 1997
  75. Pattern placement errors in mask membranes
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 15, no. 6, p. 2249, 1997
  76. Revisiting phase shifting masks in x-ray lithography
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 15, no. 6, p. 2255, 1997
  77. X-ray lithography for =100?nm ground rules in complex patterns
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 15, no. 6, p. 2517, 1997
  78. Design and fabrication of Fresnel zone plates with large numbers of zones
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 15, no. 6, p. 2522, 1997
  79. Latent image characterization of postexposure bake process in chemically amplified resists
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 15, no. 6, p. 2545, 1997
  80. Extendibility of x-ray lithography to =130 nm ground rules in complex integrated circuit patterns
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 14, no. 6, p. 4288, 1996
  81. Latent image formation: Nanoscale topography and calorimetric measurements in chemically amplified resists
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 14, no. 6, p. 3974, 1996
  82. Schottky barrier at the Au/Gap (110) interface
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol. 14, no. 4, p. 2433, 1996
  83. Scanning force microscopy measurements of latent image topography in chemically amplified resists
    Applied Physics Letters, vol. 68, no. 5, p. 717, 1996
  84. Comment on ‘‘Comments on the use of asymmetric monochromators for x-ray diffraction on a synchrotron source’’ [Rev. Sci. Instrum. 66, 2174 (1995)]
    Review of Scientific Instruments, vol. 67, no. 10, p. 3766, 1996
  85. SuperMAXIMUM: A Schwarzschild-based, spectromicroscope for ELETTRA
    Review of Scientific Instruments, vol. 66, no. 2, p. 2273, 1995
  86. Development of a hard x-ray imaging microscope
    Review of Scientific Instruments, vol. 66, no. 2, p. 2287, 1995
  87. At-wavelength metrology of 13 nm lithography imaging optics
    Review of Scientific Instruments, vol. 66, no. 2, p. 2241, 1995
  88. Novel postexposure bake simulator: First results
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 13, no. 6, p. 2963, 1995
  89. The effect of aperturing on radiation damage-induced pattern distortion of x-ray masks
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 13, no. 6, p. 3046, 1995
  90. A novel technique for high aspect ratio high resolution patterning of membranes
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 13, no. 6, p. 3061, 1995
  91. Radiation damage-induced changes in silicon nitride membrane mechanical properties
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 13, no. 6, p. 3075, 1995
  92. Alignment of a multilayer-coated imaging system using extreme ultraviolet Foucault and Ronchi interferometric testing
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 13, no. 6, p. 3089, 1995
  93. An optimization design method for chemically amplified resist process control
    IEEE Transactions on Semiconductor Manufacturing, vol. 7, no. 3, pp. 325–332, 1994
  94. Scintillation mechanisms in cerium fluoride
    Journal of Luminescence, vol. 59, no. 1-2, pp. 89–100, 1994
  95. Scanning photoemission microscopy on MAXIMUM reaches 0.1 micron resolution
    Surface Science, vol. 287-288, pp. 1046–1050, 1993
  96. Microfabrication of phase shifting zone plates for hard x-rays
    Microelectronic Engineering, vol. 21, no. 1-4, pp. 99–102, 1993
  97. Transmit: A beamline modelling program
    Microelectronic Engineering, vol. 21, no. 1-4, pp. 103–106, 1993
  98. Mechanical Response of X-Ray Masks
    Japanese Journal of Applied Physics, vol. 32, no. Part 1, No. 12B, pp. 5928–5932, 1993
  99. Linear-Fresnel-Zone-Plate-Based Two-State Alignment Method for Sub-0.25 µm X-Ray Lithography System
    Japanese Journal of Applied Physics, vol. 32, no. Part 1, No. 12B, pp. 5977–5981, 1993
  100. Recent Advances in X-Ray Lithography
    Japanese Journal of Applied Physics, vol. 31, no. Part 1, No. 12B, pp. 4178–4184, 1992
  101. Image formation in x-ray lithography: Process optimization
    Microelectronic Engineering, vol. 17, no. 1-4, pp. 135–139, 1992
  102. Analysis and optimization of x-ray masks using finite element methods
    Microelectronic Engineering, vol. 17, no. 1-4, pp. 209–213, 1992
  103. FIB repair of clear and opaque defects in x-ray masks
    Microelectronic Engineering, vol. 17, no. 1-4, pp. 249–253, 1992
  104. Fabrication of DFB laser gratings using synchrotron radiation proximity lithography
    Microelectronic Engineering, vol. 17, no. 1-4, pp. 551–554, 1992
  105. Novel beamline optics for x-ray lithography
    Microelectronic Engineering, vol. 13, no. 1-4, pp. 295–298, 1991
  106. Thermoelastic effects in x-ray lithography masks during synchrotron storage ring irradiation
    Microelectronic Engineering, vol. 11, no. 1-4, pp. 287–293, 1990
  107. X-ray assisted nitridation of silicon surface at ambient temperature
    Solid State Communications, vol. 71, no. 9, pp. 721–725, 1989
  108. Evaluation of x-ray resists for submicron lithography
    Microelectronic Engineering, vol. 6, no. 1-4, pp. 519–525, 1987
  109. Autoionization resonances in atomic Ga, In, and Pb
    Zeitschrift f�r Physik D Atoms, Molecules and Clusters, vol. 2, no. 4, pp. 327–335, 1986
  110. A synchrotron radiation x-ray lithography beam line of novel design
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 3, no. 1, p. 227, 1985
  111. ZnSe_Ge heterojunction interface states in the energy region of the valence band discontinuity
    Solid State Communications, vol. 52, no. 5, pp. 495–498, 1984
  112. Interface formation at PbTe(100) surfaces: Ge, Al, and In overlayers
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 1, no. 3, p. 570, 1983
  113. Low energy electron loss spectroscopy of Si–Ge interfaces
    Journal of Vacuum Science and Technology, vol. 19, no. 3, p. 319, 1981
  114. Energy loss spectroscopy (ELS) on the Si-Au system
    Solid State Communications, vol. 35, no. 2, pp. 151–153, 1980
  115. Electronic states of CdIn2S4 and of other II–III2–VI4 compounds: How sensitive are they to the crystal structure?
    Solid State Communications, vol. 33, no. 4, pp. 429–431, 1980
  116. Surface structure effects via photoexcited core electron diffraction for Na on Ni
    Solid State Communications, vol. 31, no. 1, pp. 15–18, 1979
  117. Initial and final state effects in the photoionization spin–orbit branching ratio of core levels
    Journal of Vacuum Science and Technology, vol. 16, no. 2, p. 507, 1979