Jisheng Pan received his B.S. degree in physics from Zhejiang University, Hangzhou, China, in 1985 and his M.S. degree in nuclear physics in 1988 from Shanghai Institute of applied Physics, Chinese Academy of Sciences, Shanghai, China, where he worked for 6 years in nuclear technology. He graduated in 1998 with his Ph.D. degree in surface science from National University of Singapore, Singapore. Currently, he serves as a Senior Scientist and Photoemission Spectroscopy (PES) Group Leader in IMRE. He also works as an Adjunct Associate Professor in the Department of Physics, National University of Singapore. His areas of research interest include photoemission technique development, surface nanostructure formation, characterization and application on catalysis, synthesis and characterization of thin films for microelectronic device fabrication, and ion beam pattern of semiconductor surfaces. Dr. Pan has authored or coauthored more than 190 refereed journal articles, one patent and delivered more than 60 presentations at international conferences. He has also provided surface analysis and consulting service to many local and international companies. In the past 10 yesar his research team has studied many material system interfaces such as metal/semiconductor, semiconductor/semiconductor, high-k insulator/semiconductor using PES technique. Some publications in this area have been cited more than 500 times. Dr. Pan has received NJC Partner Award in 2009 and 2010, Best Session Paper Award at Semicon West Exhibition (San Jose, USA) in 2002, and the Natural Science Award of Chinese Academy of Sciences in 1991. He has been listed in the Who's Who in the World 1998 (Marquis, USA). Dr. Pan has graduated 4 Ph.D. and 5 Master students, and currently supervises 9 Ph.D. research staff and students. He is an Executive Committee Member of SCS (Singapore), a Member of MRS (USA), MRS (Singapore), IPS (Singapore), and NSC (China).
Biography Updated on 30 April 2012