Alain Portavoce received his M.S. degree in 1999 and his Ph.D. degree in 2002 in materials science from the Aix-Marseille University. He joined the MRSEC center of the University of Virginia (Charlottesville, USA) in November 2002. He worked part-time at the University of Virginia with Professor Robert Hull and part-time at the T. J. Watson Research Center of IBM (New York, USA) with Dr. Frances M. Ross. He has been offered a permanent position by the CNRS in 2005 for joining the Reactivity and Diffusion at Interfaces team belonging to the Institute of Materials Microelectronics and Nanosciences of Provence (IM2NP, Marseille). His expertise includes both elaboration (MBE, CVD, pulverization, etc.) and characterization (AFM, SIMS, AES, atom probe tomography, etc.) of thin films. Today, his work concerns mainly nanometer scale solid-state diffusion and segregation and reaction in materials involved in the fabrication of microelectronic devices (semiconductors, metals, silicides, etc.). He is particularly interested in nanodiffusion and nanosize effects upon diffusion in monocrystalline, polycrystalline, and amorphous semiconductors.
Biography Updated on 28 June 2012