Erik Anderson

Erik Anderson attended the Massachusetts Institute of Technology in Cambridge, Mass, USA, and received B.S. degree in 1981, M.S. degree in 1984, and Ph.D. degree in 1988 all in the Department of Electrical Engineering and Computer Science. He joined Lawrence Berkeley National Laboratory in 1988 and worked as a Visiting Scientist at the IBM T. J. Watson Research Laboratory in Yorktown Heights, NY, developing zone plate optics for x-ray microscopy. In 1993, he moved to Berkeley to build and managed the nanofabrication facility, within the Center for X-ray optics. As part of this facility, he led the development of a specialized electron beam lithography tool, optimized for curved diffractive structures, which became operational in 1997. From 2001 until 2005, he was the director of the Center for X-ray optics. He is currently involved in EUV and soft x-ray optics development, characterization, nanofabrication, and x-ray microscopy.

Biography Updated on 11 September 2007

Articles in Scholarly Journals [Incomplete List]

  1. Magnetic soft X-ray microscopy: Imaging spin dynamics at the nanoscale
    Journal of Magnetism and Magnetic Materials, vol. 310, no. 2, pp. 2689–2692, 2007
  2. Table top nanopatterning with extreme ultraviolet laser illumination
    Microelectronic Engineering, vol. 84, no. 5-8, pp. 721–724, 2007
  3. Template fabrication for the 32nm node and beyond
    Microelectronic Engineering, vol. 84, no. 5-8, pp. 853–859, 2007
  4. Exploring nanomagnetism with soft X-ray microscopy
    Surface Science, vol. 601, no. 20, pp. 4680–4685, 2007
  5. Shot noise models for sequential processes and the role of lateral mixing
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 24, no. 4, p. 1902, 2006
  6. Extreme Ultraviolet Lithography Capabilities at the Advanced Light Source Using a 0.3-NA Optic
    IEEE Journal of Quantum Electronics, vol. 42, no. 1, pp. 44–50, 2006
  7. Specialized Electron Beam Nanolithography for EUV and X-Ray Diffractive Optics
    IEEE Journal of Quantum Electronics, vol. 42, no. 1, pp. 27–35, 2006
  8. Magnetic soft x-ray microscopy at 15 nm resolution probing nanoscale local magnetic hysteresis (invited)
    Journal of Applied Physics, vol. 99, no. 8, p. 08H303, 2006
  9. Magnetic microstructures and their dynamics studied by X-ray microscopy
    Micron, vol. 37, no. 4, pp. 296–300, 2006
  10. Soft X-ray microscopy of nanomagnetism
    Materials Today, vol. 9, no. 1-2, pp. 26–33, 2006
  11. Sub-38nm resolution tabletop microscopy with 13nm wavelength laser light
    Optics Letters, vol. 31, no. 9, p. 1214, 2006
  12. Single-element objective lens for soft x-ray differential interference contrast microscopy
    Optics Letters, vol. 31, no. 10, p. 1564, 2006
  13. Nanometer-scale ablation with a table-top soft x-ray laser
    Optics Letters, vol. 31, no. 24, p. 3615, 2006
  14. Tabletop Lasers in the Extreme Ultraviolet
    Optics and Photonics News, vol. 17, no. 11, p. 30, 2006
  15. Nanoimaging with a compact extreme-ultraviolet laser
    Optics Letters, vol. 30, no. 16, p. 2095, 2005
  16. Soft X-ray microscopy at a spatial resolution better than 15?nm
    Nature, vol. 435, no. 7046, Article ID nature03719, 3 pages, 2005
  17. Polarization-modulated magnetic soft-x-ray transmission microscopy
    Journal of Applied Physics, vol. 98, no. 9, p. 093907, 2005
  18. Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 23, no. 6, p. 2840, 2005
  19. Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 22, no. 6, p. 2962, 2004
  20. At-wavelength alignment and testing of the 0.3 NA MET optic
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 22, no. 6, p. 2956, 2004
  21. Fabrication of high-efficiency multilayer-coated gratings for the EUV regime using e-beam patterned substrates
    Optics Communications, vol. 229, no. 1-6, pp. 109–116, 2004
  22. Design, Fabrication, and Characterization of High-Efficiency Extreme-Ultraviolet Diffusers
    Applied Optics, vol. 43, no. 28, p. 5323, 2004
  23. 20-nm-resolution Soft x-ray microscopy demonstrated by use of multilayer test structures
    Optics Letters, vol. 28, no. 21, p. 2019, 2003
  24. 20-nm-resolution soft x-ray microscopy demonstrated by use of multilayer test structures: erratum
    Optics Letters, vol. 28, no. 24, p. 2530, 2003
  25. Phase retrieval of diffraction patterns from noncrystalline samples using the oversampling method
    Physical Review B, vol. 67, no. 17, 2003
  26. Interferometer-controlled scanning transmission X-ray microscopes at the Advanced Light Source
    Journal of Synchrotron Radiation, vol. 10, no. 2, pp. 125–136, 2003
  27. Surface Review and Letters, vol. 9, no. 1, p. 177, 2002
  28. Diffractive Optical Elements Based on Fourier Optical Techniques: A New Class of Optics for Extreme Ultraviolet and Soft X-Ray Wavelengths
    Applied Optics, vol. 41, no. 35, p. 7384, 2002
  29. Precision fringe metrology using a Fresnel zone plate
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 20, no. 6, p. 3075, 2002
  30. Electromigration in passivated Cu interconnects studied by transmission x-ray microscopy
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 20, no. 6, p. 3089, 2002
  31. Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 20, no. 6, p. 2829, 2002
  32. Influence of gas transport on the oxidation rate of aluminum arsenide
    Journal of Applied Physics, vol. 91, no. 1, p. 121, 2002
  33. Chemical profiling of single nanotubes: Intramolecular p–n–p junctions and on-tube single-electron transistors
    Applied Physics Letters, vol. 80, no. 1, p. 73, 2002
  34. Resists for next generation lithography
    Microelectronic Engineering, vol. 61-62, no. 1-3, pp. 707–715, 2002
  35. Soft X-ray microscopy to 25nm with applications to biology and magnetic materials
    Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, vol. 467-468, pp. 841–844, 2001
  36. Spatial coherence properties of undulator radiation based on Thompson–Wolf two-pinhole measurement
    Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, vol. 467-468, pp. 913–916, 2001
  37. Fabrication of high-efficiency multilayer-coated binary blazed gratings in the EUV regime
    Optics Communications, vol. 200, no. 1-6, pp. 27–34, 2001
  38. Substrate cooling efficiency during cryogenic inductively coupled plasma polymer etching for diffractive optics on membranes
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 19, no. 6, p. 2896, 2001
  39. Characterization of reactive ion etch lag scaling
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 19, no. 6, p. 2082, 2001
  40. Influence of sub-100 nm scattering on high-energy electron beam lithography
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 19, no. 6, p. 2504, 2001
  41. At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 19, no. 6, p. 2396, 2001
  42. Sub-60-nm quasi-planar FinFETs fabricated using a simplified process
    IEEE Electron Device Letters, vol. 22, no. 10, pp. 487–489, 2001
  43. Nature, vol. 407, no. 6800, pp. 57–60, 2000
  44. Spatial coherence characterization of undulator radiation
    Optics Communications, vol. 182, no. 1-3, pp. 25–34, 2000
  45. A 20 nm gate-length ultra-thin body p-MOSFET with silicide source/drain
    Superlattices and Microstructures, vol. 28, no. 5-6, pp. 445–452, 2000
  46. Surface enhanced sum frequency generation of carbon monoxide adsorbed on platinum nanoparticle arrays
    The Journal of Chemical Physics, vol. 113, no. 13, p. 5432, 2000
  47. Calixarene G-line double resist process with 15 nm resolution and large area exposure capability
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 18, no. 6, p. 3428, 2000
  48. Extreme ultraviolet alignment and testing of a four-mirror ring field extreme ultraviolet optical system
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 18, no. 6, p. 2911, 2000
  49. Nanofabrication and diffractive optics for high-resolution x-ray applications
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 18, no. 6, p. 2970, 2000
  50. High resolution inductively coupled plasma etching of 30 nm lines and spaces in tungsten and silicon
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 18, no. 6, p. 3471, 2000
  51. Imaging soft X-ray microscope at Rits Synchrotron Radiation Center
    Journal of Synchrotron Radiation, vol. 5, no. 3, pp. 1102–1104, 1998
  52. Catalysis Letters, vol. 45, no. 1/2, pp. 5–13, 1997
  53. Soft X-ray microscope with zone plate at UVSOR
    Journal of Electron Spectroscopy and Related Phenomena, vol. 80, pp. 365–368, 1996
  54. Soft x-ray scanning microtomography with submicrometer resolution
    Review of Scientific Instruments, vol. 66, no. 2, p. 1431, 1995
  55. A zone plate soft x-ray microscope using monochromatized undulator radiation at the beamline NE1B of the TRISTAN Accumulation Ring
    Review of Scientific Instruments, vol. 66, no. 2, p. 1401, 1995
  56. Astigmatism correction in x-ray scanning photoemission microscope with use of elliptical zone plate
    Applied Physics Letters, vol. 60, no. 9, p. 1040, 1992
  57. X-ray spectromicroscopy with a zone plate generated microprobe
    Applied Physics Letters, vol. 56, no. 19, p. 1841, 1990