Harald Leiste holds a Diploma in physics (1980) and a Dr. rer. nat. (Doctor of Natural Sciences) degree (1985) from University of Freiburg, Germany. He worked as a Scientist in the area of thin film development at the Department of Composites and Thin Films, Institute for Applied Materials, Karlsruhe Institute of Technology (KIT), Germany, from 1985 to 2008, and since 2009, he has been working as a Group Leader at the same institute. His areas of expertise include thin film technology, reactive and nonreactive physical vapour deposition (PVD), RF- and DC- magnetron sputtering, metallic, nitride, carbide, oxide films, thin film concepts, growth mechanism, mechanical, optical, and magnetic characterization, microstructural characterization, X-ray diffraction (Bragg-Brentano, rocking, reciprocal space mapping), X-ray reflection (XRR), and transmission electron microscopy (TEM). Leiste is a Member of Deutsche Gesellschaft für Materialkunde (DGM).
Biography Updated on 17 January 2013