Massimo Tallarida is an Associate Researcher at the Brandenburg University of Technology (BTU) in Cottbus, Germany. He received his M.S. degree in physics at the University of Rome, Rome, Italy "La Sapienza" in 2000, the Ph.D. degree in physics (2005) at the Freie Universität in Berlin (Germany) working at Fritz Haber Institute, Berlin. Since 2004, he is an Associate Scientist in the Chair of Applied Physics-Sensors at BTU. Since 1999, his research expertise was concerned with photoemission and X-ray absorption spectroscopy with synchrotron radiation, investigating surfaces and thin films of metals and semiconductors. In his most recent research, he developed a system for studying in situ the growth of oxides by atomic layer deposition with in situ photoemission, X-ray absorption and electron loss spectroscopy, and with atomic force microscopy.
Biography Updated on 6 August 2013