Three-Dimensional Residue-Free Volume Removal inside Sapphire by High-Temperature Etching after<?layout cmd="newline"?> Irradiation of Femtosecond Laser Pulses

<table>Schematic
diagram of removal property of sapphire by femtosecond laser-assisted etching.
Thick broken lines are borderlines of three issues; corresponding double arrows
show the desirable region.</table>

Laser Chemistry

fig3

Figure 3

Figure 3: Three-Dimensional Residue-Free Volume Removal inside Sapphire by High-Temperature Etching after<?layout cmd="newline"?> Irradiation of Femtosecond Laser Pulses 

Laser Chemistry

Three-Dimensional Residue-Free Volume Removal inside Sapphire by High-Temperature Etching after Irradiation of Femtosecond Laser Pulses

Figure 3