The Effects of RF Sputtering Power and Gas Pressure on Structural and Electrical Properties of ITiO Thin Film

Figure 5

AFM morphologies of the ITiO film at different Ar gas pressures. (a) 5 mTorr, (b) 10 mTorr, (c) 15 mTorr, (d) 20 mTorr.

(a)

(b)

(c)

(d)