Table 1: RF sputtering conditions for deposition of ZnO films from ceramic targets.

Deposition parameterConditions

R.F. power (WAr)200 W
Presputtering5 min before each deposition
Base pressure5 × 10−6 torr
Argon pressure (PAr)5 mtorr
Substrate temperatureUnheated and no control
Target-to-substrate distance11.5 cm