Table 1:
RF sputtering conditions for deposition of ZnO films from ceramic targets.
Deposition parameter
Conditions
R.F. power (W
Ar
)
200 W
Presputtering
5 min before each deposition
Base pressure
5 × 10
−6
torr
Argon pressure (P
Ar
)
5 mtorr
Substrate temperature
Unheated and no control
Target-to-substrate distance
11.5 cm