ZnO:Al Grown by Sputtering from Two Different Target Sources: A Comparison Study

Table 2

Measured electrical properties for ZnO:Al₂O₃ films grown from ceramic targets.

Thickness (μm)	Sheet resistance (Ω/□)	Resistivity (Ω·cm)	Mobility (cm^2/V·s)	Carrier concentration (1/cm^3)
0.04	3.75 × 10^5	1.49	0.4	−1.05 × 10^19
0.1	5.71 × 10^3	0.0571	1.5	−7.30 × 10^19
1.0	24.4	0.00244	5.46	−4.69 × 10^20
2.0	7.15	0.00143	10.3	−4.25 × 10^20