Effect of Oxygen Mixing Percentage on Mechanical and Microwave Dielectric Properties of SrBi₄Ti₄O₁₅ Thin Films

Figure 5

(a) L–D curves. (b) Hardness vs. contact depth. (c) Young’s modulus vs. contact depth (inset: indentation image). (d) Friction coefficient vs. applied load (inset: scratch test image) of SrBi₄Ti₄O₁₅ films deposited at 25%–100% OMP.

(a)

(b)

(c)

(d)