Surface and Buildup Region Dose Measurements with Markus Parallel-Plate Ionization Chamber, GafChromic EBT3 Film, and MOSFET Detector for High-Energy Photon Beams

<div>The angular dependence of the epoxy side of the MOSFET dosimeter for 6 MV and 15 MV.</div>

Advances in High Energy Physics

fig7

Figure 7

Figure 7: Surface and Buildup Region Dose Measurements with Markus Parallel-Plate Ionization Chamber, GafChromic EBT3 Film, and MOSFET Detector for High-Energy Photon Beams 

Figure 7 | Surface and Buildup Region Dose Measurements with Markus Parallel-Plate Ionization Chamber, GafChromic EBT3 Film, and MOSFET Detector for High-Energy Photon Beams 