Table 1: PVD parameters and thickness of arc evaporated Cr- and Ti-based interlayers.

InterlayerBias (V)Gas phaseChamber pressure (Pa) Deposition temperature (°C) Thickness ( m)
ArN2CH4

CrN −80 100%2.03508
TiN_a −135 100%1.54507
TiN_b −135 100%1.54503.3
CrC −70 84%16%1.04500.6
TiC −70 70%30%1.04502
Ti(C, N) −70 84%16%1.04503