Purity of Ion Beams: Analysis and Simulation of Mass Spectra and Mass Interferences in Ion Implantation

<table>Layout of the beamline of an implanter from ion source to analyzer magnet. The beamline is divided into the three sections [Src-Ex], [Ex-Gnd], and [Gnd-An]. The ion beam generates secondary electrons which are accelerated in the sections [Src-Ex] and [Ex-Gnd].</table>

Advances in Materials Science and Engineering

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Figure 1

Figure 1: Purity of Ion Beams: Analysis and Simulation of Mass Spectra and Mass Interferences in Ion Implantation 