Mechanical and Structural Properties of Fluorine-Ion-Implanted Boron Suboxide

Figure 5

An illustration of the basic physical processes (from left to right) involved in the formation of clustered particles from an implant with respect to the ion dose. Surface sputtering under irradiation is also considered [36]. Diagram courtesy of Stepanov [3]. Note. In this study, all characterization was done on as-implanted specimen; no annealing was done.