Reactive Chemical Vapor Deposition Method as New Approach for Obtaining Electroluminescent Thin Film Materials

<table>Two temperature zones reactor for gas phase reaction (<a href="https://static.hindawi.com/articles/amse/volume-2012/809028/figures/#EEq1">1</a>). </table>

Advances in Materials Science and Engineering

fig1

Figure 1

Figure 1: Reactive Chemical Vapor Deposition Method as New Approach for Obtaining Electroluminescent Thin Film Materials 