Nonstoichiometry in TiO_2−𝑦 Studied by Ion Beam Methods and Photoelectron Spectroscopy

Table 2

Summary of the microanalysis of TiO_2−𝑦 by RBS and NRA; 𝑆_𝑑: deposition rate, 𝑑: film thickness, 𝑁_O: surface number of oxygen atoms, 𝑁_Ti: surface number of titanium atoms, 𝜌_mat: film density; calculated density of anatase 𝜌_𝐴=3.864 g/cm³ and calculated density of rutile 𝜌_𝑅=4.250 g/cm³ according to [1].

Sample/substrate	Deposition method	Time (sec)	𝑆𝑑 (nm/s)	𝑑 (nm)	𝑁O×10^17 (at/cm^2) from NRA	𝑁O×10^17 (at/cm^2) from RBS	𝑁Ti×10^17 (at/cm^2) from RBS	𝜌mat (g/cm^3) from RBS
Na1/C	dc magnetron sputtering	41	1.43	58–60	3.25	3.03	1.58	3.17–3.39
Na2/C	dc magnetron sputtering	48	1.17	54–58	3.36	3.20	1.52	3.67–3.94
Na3/C	dc magnetron sputtering	57	0.98	52–58	3.41	3.09–3.22	1.43	3.67–4.09
Na4/C	dc magnetron sputtering	72	0.76	54–56	3.16	2.79	1.40	3.22–3.33
Na5/C	dc magnetron sputtering	95	0.54	50–52	2.53	2.69–2.74	1.31	3.15–3.27
Na6/C	dc magnetron sputtering	143	0.23	32–34	2.45	2.48	1.16	3.35–4.60
M50/C	rf sputtering	2750	0.02	50–60	3.54	2.93	1.57	3.27–3.92
M50/Si/ SiO2	rf sputtering	2750	0.02	50–60	7.95	—	1.6	3.27–3.92
WO_1/Si	rf sputtering	15000	0.02	300	17	—	9.13	3.7