Nonstoichiometry in TiO_2−𝑦 Studied by Ion Beam Methods and Photoelectron Spectroscopy

Table 4

Relative contributions (%) to the Ti 2p_3/2 and O 1s XPS lines from the different oxidation states for TiO_2−𝑦 thin films deposited by the reactive sputtering.

𝑆𝑑 (nm/s)	OII	OI	OII/(OI+OII)	Ti^4+	Ti^3+/Ti^2+	Ti^0
1.82	19	81	0.19	75.4	10.5	14.1
0.88	15	85	0.15	91.5	5.1	3.4
0.23	13	87	0.13	91.9	4.7	3.4