Series Resistance Analysis of Passivated Emitter Rear Contact Cells Patterned Using Inkjet Printing

<table>Focused ion beam (FIB) image of the rear of a BA-LIP Ni with LIP Cu test cell. Unwanted Cu plating can be seen at the edges of the rear point contacts.</table>

Advances in Materials Science and Engineering

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Figure 7

Figure 7: Series Resistance Analysis of Passivated Emitter Rear Contact Cells Patterned Using Inkjet Printing 