Table 3:
Cell performance from light IV data.
Ni-plating method
(mV)
Fill factor
Series resistance (Ω
cm
2
)
Shunt resistance (kΩ
cm
2
)
Electroless Ni
646
0.61
4.1
42.7
Bias-assisted LIP Ni
617
0.59
1.5
0.10