Series Resistance Analysis of Passivated Emitter Rear Contact Cells Patterned Using Inkjet Printing

Table 4

Sources of series resistance.

Resistance source	Electroless Ni		Bias-Assisted LIP Ni
	Rs (Ω⋅cm^2)	𝑃loss(%)	Rs (Ω⋅cm^2)	𝑃loss (%)
Lateral resistance through the emitter	0.152	0.6	0.152	0.6
Line resistance along the fingers*	0.112	0.4	0.112	0.4
Resistance through the base*	0.072	0.3	0.072	0.3
Spreading resistance**	0.560	2.2	0.560	2.2
Front contact resistance	0.090	4.6	0.107	5.5
Rear contact resistance***	0.028	28.7	0.004	4.1
Total	4.9	36.7	2.7	13.0
Total measured 𝑅 from IV	4.1		1.48
Total measured 𝑅 from Rs-PL	5.3		2.9

*[14, 15].
**[16, 17].
***From [18].