Table 1: Deposition process parameters.

SampleAr : C2H2RF Power (W)Time (s)Gas flow rate (sccm)

11 : 16003030
21 : 26003030
32 : 16003030
43 : 16003030
51 : 26001030
61 : 26002030
71 : 26006030
81 : 23003030
91 : 29003030
101 : 212003030
11*

Blank sample.