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Advances in Materials Science and Engineering
Volume 2013 (2013), Article ID 950439, 5 pages
http://dx.doi.org/10.1155/2013/950439
Research Article

Surface State Capture Cross-Section at the Interface between Silicon and Hafnium Oxide

Department of Electronic Engineering, Ming Chuan University, Taoyuan, Taiwan 333, Taiwan

Received 5 August 2013; Accepted 30 September 2013

Academic Editor: Chun-Hsing Shih

Copyright © 2013 Fu-Chien Chiu. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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