Comparison of Microstructural and Morphological Properties of Electrodeposited Fe-Cu Thin Films with Low and High Fe : Cu Ratio
Figure 4
Two- and three-dimensionalAFM topographic images and one-dimensional line scans of electrodeposited Fe–Cu films grown from the electrolytes with low, intermediate, and high Fe ion concentrations (a) 0.02 M (b) 0.04 M, and (c) 0.08 M, respectively.
