Optimization of the Cathode Arc Plasma Deposition Processing Parameters of ZnO Film Using the Grey-Relational Taguchi Method

Table 3

Experimental results for the transmittance and resistivity of the deposited ZnO films on glass substrate.

Experiment number	Control factors			Transmittance (%)			Resistivity (10^−3 Ω-cm)
	A	B	C	Y1	Y2	Mean value	Y1	Y2	Mean value
1	1	1	1	87.57	86.73	87.15	5.56	4.59	5.51
2	2	2	2	83.17	82.47	82.82	6.19	5.71	5.95
3	3	3	3	77.71	77.43	77.57	2.99	2.79	2.89
4	1	2	3	78.14	77.66	77.90	6.75	5.97	6.36
5	2	3	1	81.25	79.61	80.43	7.25	5.99	6.62
6	3	1	2	84.98	84.82	84.90	6.13	5.93	6.03
7	1	3	2	77.96	77.34	77.65	5.46	5.23	5.35
8	2	1	3	80.39	80.17	80.28	4.32	4.28	4.30
9	3	2	1	88.17	87.23	87.70	5.66	5.12	5.39