Characteristics of Bilayer Molybdenum Films Deposited Using RF Sputtering for Back Contact of Thin Film Solar Cells

<table>XRD patterns of Mo films prepared at different RF sputtering powers and working pressures: (a) 100 W/12 mTorr, (b) 100 W/4.5 mTorr, and (c) 30 W/12 mTorr.</table>

Advances in Materials Science and Engineering

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Figure 2

Figure 2: Characteristics of Bilayer Molybdenum Films Deposited Using RF Sputtering for Back Contact of Thin Film Solar Cells 