Mechanical Properties and Thermal Stability of TiN/Ta Multilayer Film Deposited by Ion Beam Assisted Deposition

Table 1

Deposition parameters for TiN/Ta multilayer film.

Layers	The sputtering ion source	The assisting ion source	Deposition time for each layer	Number of layers
Ti transition layer	Ar^+ beam, beam energy 2.5 keV, beam current 80 mA, ion flux 2.4×10^14 ions/cm^2·s	—	10 min	1
TiN sublayer	Ar^+ beam, beam energy 2.5 keV, beam current 80 mA, ion flux 2.4×10^14 ions/cm^2·s	N^+ beam, beam energy 0.2 keV, beam current 30 mA, ion flux 4.8×10^14 ions/cm^2·s	1 min	110
Ta sublayer	Ar^+ beam, beam energy 2.5 keV, beam current 80 mA, ion flux 2.3×10^14 ions/cm^2·s	—	1 min	110
TiN top layer	Ar^+ beam, beam energy 2.5 keV, beam current 80 mA, ion flux 2.4×10^14 ions/cm^2·s	N^+ beam, beam energy 0.2 keV, beam current 30 mA, ion flux 4.8×10^14 ions/cm^2·s	1 min	1