Annealing Heat Treatment of ZnO Nanoparticles Grown on Porous Si  Substrate Using Spin-Coating Method

<table>FESEM and AFM images of ZnO thin films on PSi annealed at (a) and (i) 300°C, (b) and (ii) 400°C, (c) and (iii) 500°C, (d) and (iv) 600°C, and (e) and (v) 700°C.</table>

Advances in Materials Science and Engineering

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Figure 2

Figure 2: Annealing Heat Treatment of ZnO Nanoparticles Grown on Porous Si  Substrate Using Spin-Coating Method 