948708.fig.002a
(a) Oxidation
948708.fig.002b
(b) Photolithography
948708.fig.002c
(c) RIE of SiO2
948708.fig.002d
(d) RIE of Si
948708.fig.002e
(e) Sharpening Oxidation
948708.fig.002f
(f) Si-tip-emitter
Figure 2: Schematic of the structured cathode fabrication process (simulated with IntelliSuite). (a) Thermal growth of SiO2 layer. (b) Photolithography with AZ5214. (c) Transferring of the structures into SiO2 by reactive-ion etching. (d) Reactive-ion etching of the bulk Si. (e) Sharpening of the tips by wet thermal oxidation. (f) Wet chemical removal of SiO2.