
(a) Arrays near wafer center (rms deviation: 0.063) (mean value: −0.029) 


(b) Arrays near wafer edge (rms deviation: 0.075) (mean value: 0.061) 


(c) Arrays near wafer center (rms deviation: 0.048) (mean value: 0.016) 


(d) Arrays near wafer edge (rms deviation: 0.049) (mean value: −0.023) 

Figure 7: Variation of the anisotropic factor from the averaged value of anisotropy on the quarter at different etch parameters: (a) and (b) 90 mTorr, 60 s, 90 W, (c) and (d) 50 mTorr, 90 s, 90 W. Values in brackets are the root mean square deviation and the arithmetic mean of the variation. 
