Deposition-Parameter-Determined Resistive Switching Characteristics in TiO<sub><i>x</i></sub>/Pb(Zr<sub>0.52</sub>Ti<sub>0.48</sub>)O<sub>3</sub> Bilayers

<div>XPS spectra of <svg height="13.8582pt" id="M69" style="vertical-align:-5.17011pt" version="1.1" viewbox="-0.0498162 -8.68809 21.537 13.8582" width="21.537pt" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink"><g transform="matrix(.013,0,0,-0.013,0,0)"><path d="M601 496C596 555 591 627 591 675H567C551 656 544 650 516 650H120C91 650 79 651 64 675H41C38 619 34 555 29 492H63C75 537 83 566 96 582C110 604 128 612 207 612H272V126C272 46 264 38 170 33V0H464V33C368 38 359 48 359 126V612H430C502 612 520 605 535 582C547 566 556 541 567 492L601 496Z" id="g58-82"></path><glyph.data ascent="1007" descent="-369" horiz-adv-x="628" vert-adv-y="628"></glyph.data></g><g transform="matrix(.013,0,0,-0.013,7.994,0)"><path d="M138 535C169 535 191 560 191 589C191 620 168 644 139 644S85 620 85 589C85 560 110 535 138 535ZM257 0V30C192 35 185 43 185 109V453C142 435 94 422 40 414V386C101 378 104 372 104 311V109C104 41 97 35 33 30V0H257Z" id="g58-103"></path><glyph.data ascent="1007" descent="-369" horiz-adv-x="275" vert-adv-y="275"></glyph.data></g><g transform="matrix(.0091,0,0,-0.0091,11.613,3.001)"><path d="M414 144C384 79 371 75 317 75H135L276 221C367 317 408 376 408 465C408 569 328 635 237 635C178 635 131 610 100 575L42 494L67 471C94 511 138 565 205 565C277 565 321 518 321 435C321 348 259 269 195 195C146 136 89 82 33 26V0H411C423 44 433 88 446 135L414 144Z" id="g58-48"></path><glyph.data ascent="1007" descent="-369" horiz-adv-x="487" vert-adv-y="487"></glyph.data></g><g transform="matrix(.0091,0,0,-0.0091,16.045,3.001)"><path d="M173 382V461C125 442 68 425 25 418V390C88 382 92 382 92 317V-127C92 -191 84 -199 18 -204V-235H259V-204C180 -196 173 -192 173 -120V7C188 -1 212 -11 243 -12C375 12 495 109 495 261C495 361 427 451 316 451C303 451 283 446 266 435L173 382ZM173 345C200 365 243 388 274 388C346 388 409 329 409 222C409 111 353 40 266 40C231 40 196 56 173 79V345Z" id="g58-110"></path><glyph.data ascent="1007" descent="-369" horiz-adv-x="534" vert-adv-y="534"></glyph.data></g></svg> photoemissions in <svg height="11.8487pt" id="M70" style="vertical-align:-3.160609pt" version="1.1" viewbox="-0.0498162 -8.68809 27.2863 11.8487" width="27.2863pt" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink"><g transform="matrix(.013,0,0,-0.013,0,0)"><path d="M601 496C596 555 591 627 591 675H567C551 656 544 650 516 650H120C91 650 79 651 64 675H41C38 619 34 555 29 492H63C75 537 83 566 96 582C110 604 128 612 207 612H272V126C272 46 264 38 170 33V0H464V33C368 38 359 48 359 126V612H430C502 612 520 605 535 582C547 566 556 541 567 492L601 496Z" id="g58-82"></path><glyph.data ascent="1007" descent="-369" horiz-adv-x="628" vert-adv-y="628"></glyph.data></g><g transform="matrix(.013,0,0,-0.013,7.994,0)"><path d="M138 535C169 535 191 560 191 589C191 620 168 644 139 644S85 620 85 589C85 560 110 535 138 535ZM257 0V30C192 35 185 43 185 109V453C142 435 94 422 40 414V386C101 378 104 372 104 311V109C104 41 97 35 33 30V0H257Z" id="g58-103"></path><glyph.data ascent="1007" descent="-369" horiz-adv-x="275" vert-adv-y="275"></glyph.data></g><g transform="matrix(.013,0,0,-0.013,11.569,0)"><path d="M387 665C175 665 46 498 46 318C46 123 194 -15 374 -15C558 -15 712 114 712 333C712 535 557 665 387 665ZM364 625C495 625 607 518 607 306C607 115 505 25 396 25C256 25 151 161 151 346C151 532 255 625 364 625Z" id="g58-77"></path><glyph.data ascent="1007" descent="-369" horiz-adv-x="757" vert-adv-y="757"></glyph.data></g><g transform="matrix(.0091,0,0,-0.0091,21.41,3.001)"><path d="M545 403C545 425 527 451 498 451C448 451 400 404 312 286L290 341C262 412 246 451 219 451C182 451 138 404 92 345L112 323C152 368 169 378 181 378C192 378 201 359 216 321L257 214C184 115 142 69 113 69C102 69 93 73 88 79S78 89 68 89C47 89 24 61 24 40C24 8 49 -12 75 -12C125 -12 175 31 271 175L312 64C330 15 357 -12 382 -12C421 -12 475 35 515 98L496 121C466 88 439 62 420 62C402 62 384 92 363 147L325 247C349 280 374 309 397 333C422 361 446 381 462 381C471 381 481 374 488 366C493 360 499 357 505 357C521 357 545 380 545 403Z" id="g50-121"></path><glyph.data ascent="3443" descent="-2856" horiz-adv-x="569" vert-adv-y="569"></glyph.data></g></svg> deposited at 30 (a, d), 80 (b, e), and 150°C (c, f) in 2.0 Pa oxygen pressure (a–c) and in background vacuum (d–f).</div>

Advances in Materials Science and Engineering

fig4

Figure 4

Figure 4: Deposition-Parameter-Determined Resistive Switching Characteristics in TiO<sub><i>x</i></sub>/Pb(Zr<sub>0.52</sub>Ti<sub>0.48</sub>)O<sub>3</sub> Bilayers 

Advances in Materials Science and Engineering

Deposition-Parameter-Determined Resistive Switching Characteristics in TiOx/Pb(Zr0.52Ti0.48)O3 Bilayers

Figure 4

Deposition-Parameter-Determined Resistive Switching Characteristics in TiO_x/Pb(Zr_0.52Ti_0.48)O₃ Bilayers