Ultra-High and Near-Zero Refractive Indices of Magnetron Sputtered Thin-Film Metamaterials Based on Ti_xO_y

Figure 1

XRD patterns for films obtained by DC magnetron sputtering (A: anatase, R: rutile, s: substrate, 1: sample deposited for 45 min and not further thermally treated, 2: sample deposited for 45 min and thermally treated at 400°C, and 3: sample deposited for 7 min and thermally treated at 400°C).