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Advances in OptoElectronics
Volume 2009 (2009), Article ID 457549, 9 pages
Tensorial Model for Photolithography Aerial Image Simulation
Ecole Centrale Marseille Institut Fresnel, CNRS UMR 6133, 13397 Marseille Cedex 20, France
Received 21 July 2009; Accepted 31 August 2009
Academic Editor: Samir K. Mondal
Copyright © 2009 Caroline Fossati et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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