- About this Journal
- Abstracting and Indexing
- Aims and Scope
- Article Processing Charges
- Articles in Press
- Author Guidelines
- Bibliographic Information
- Citations to this Journal
- Contact Information
- Editorial Board
- Editorial Workflow
- Free eTOC Alerts
- Publication Ethics
- Reviewers Acknowledgment
- Submit a Manuscript
- Subscription Information
- Table of Contents
Advances in OptoElectronics
Volume 2012 (2012), Article ID 592754, 8 pages
doi:10.1155/2012/592754
Plasmonic Nanostructure for Enhanced Light Absorption in Ultrathin Silicon Solar Cells
1School of Physical Science and Engineering and Key Laboratory of Material Physics of The Ministry of Education of China, Zhengzhou University, Zhengzhou 450052, China
2Electric and information Engineering College, Pingdingshan University, Henan Province, Pingdingshan 467000, China
3Department of Mathematics and Physics, Zhengzhou Institute of Aeronautical Industry Management, Zhengzhou 450015, China
Received 9 July 2012; Revised 18 September 2012; Accepted 24 September 2012
Academic Editor: Pavel A. Belov
Copyright © 2012 Jinna He et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
How to Cite this Article
Jinna He, Chunzhen Fan, Junqiao Wang, Yongguang Cheng, Pei Ding, and Erjun Liang, “Plasmonic Nanostructure for Enhanced Light Absorption in Ultrathin Silicon Solar Cells,” Advances in OptoElectronics, vol. 2012, Article ID 592754, 8 pages, 2012. doi:10.1155/2012/592754