Editorial Board

Editor-in-Chief

Frank Shi, University of California, USA

Associate Editors

Armin G. Aberle, National University of Singapore, Singapore
Ralf Bergmann
, Bremer Institut für angewandte Strahltechnik GmbH, Germany
Xian An Cao
, West Virginia University, USA
Alison Chaiken
, HP Labs, USA
W.-C. Chen
, National Taiwan University, Taiwan
Philippe Goldner
, Ecole Nationale Supérieure de Chimie de Paris, France
Volker Haerle
, OSRAM Opto Semicond GmbH, Germany
Jung Y. Huang
, Chiao Tung University, Taiwan
Alex K-Y. Jen
, University of Washington, USA
Dragana M. Jovic
, University of Belgrade, Serbia
A. J. Kenyon
, University College London, United Kingdom
H. S. Kwok
, Hong Kong University of Science & Technology, China
Yaomin Lin
, Alfred E. Mann Foundation for Scientific Research, USA
Wenning Liu
, Pacific National Labs, USA
Yalin Lu
, U.S. Air Force Academy, USA
Samir K Mondal
, Central Scientific Instruments Organization, India
Jong ha Moon
, Chonnam National University, South Korea
Bert Jan Offrein
, Zurich Research Laboratory, Switzerland
John Pern
, National Renewable Energy Laboratory, USA
Adrian Podoleanu
, The University of Kent, United Kingdom
J. Lakshmana Rao
, Sri Venkateswara University, India
R. Reisfeld
, Hebrew University of Jerusalem, Israel
Lucimara Stolz Roman
, Universidade Federal do Paraná, Brazil
Jayanta Kumar Sahu
, Optoelectronics Research Centre, United Kingdom
Somenath N. Sarkar
, University of Calcutta, India
Christian Seassal
, Ecole Centrale de Lyon, France
Vasily Spirin
, Division de Fisica Aplicada, CICESE, Mexico
Chang Q. Sun
, Nanyang Technological University, Singapore
Pieter L. Swart
, University Johannesburg, South Africa
Andreas Tuennermann
, Fraunhofer Institute & Friedrich-Schiller-University, Germany
Ching Ping Wong
, Georgia Institute of Technology, USA
Jianping Zhang
, SET Inc., USA
Nikolay Zheludev
, University of Southampton, United Kingdom
Yuqin Zong
, NIST, USA

Advisory Editors

Larry Crane, Henkel Corporation, USA
Hideya Kumomi
, Canon Research Center, Japan
Alfred Margaryan
, AFO Research Inc., USA
P. M. Rentzepis
, University of California, USA