Stress Induced Effects for Advanced Polarization Control in Silicon Photonics Components

Figure 10

(a) SEM image of an MMI-coupled ring resonator. (b) A closeup of the MMI section. (c) TE and TM transmission spectra of the ring resonator, with an upper SiO₂ cladding of 0.8 𝜇m thick and film stress of 𝜎_film = −250 MPa.