Research Letter

Ultrasoft and High Magnetic Moment CoFe Films Directly Electrodeposited from a B-Reducer Contained Solution

Figure 3

The 2 𝜃 XRD results of ~0.6  𝜇 m C o 4 0 F e 6 0 films on Si(100) wafer. (a) and (b) stand for without adding and adding B-reducer, respectively.
342976.fig.003a
(a)
342976.fig.003b
(b)