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Advances in Physical Chemistry
Volume 2012 (2012), Article ID 205380, 6 pages
http://dx.doi.org/10.1155/2012/205380
Research Article

Characterization of the Chemical Kinetics in an O2/HMDSO RF Plasma for Material Processing

Dipartimento di Fisica Occhialini, Università degli Studi di Milano-Bicocca, Piazza della Scienza 3, 20126 Milano, Italy

Received 10 September 2012; Revised 26 October 2012; Accepted 27 October 2012

Academic Editor: Hiroshi Onishi

Copyright © 2012 Ruggero Barni et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

Experimental study of the plasma gas phase in low-pressure radiofrequency discharges of oxygen and hexamethyldisiloxane is presented. The plasma phase has been studied by means of optical emission spectroscopy. Mass spectroscopy of the neutral and of the charged species has been performed too, directly sampling the plasma gas phase, by a dedicated spectrometer. We also measured the ion energy distribution. We have studied the influence of the operating conditions on the plasma gas-phase composition which plays a primary role in the formation process of SiO2 films, which are known for their important applicative uses.