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Advances in Physical Chemistry
Volume 2012 (2012), Article ID 205380, 6 pages
Characterization of the Chemical Kinetics in an O2/HMDSO RF Plasma for Material Processing
Dipartimento di Fisica Occhialini, Università degli Studi di Milano-Bicocca, Piazza della Scienza 3, 20126 Milano, Italy
Received 10 September 2012; Revised 26 October 2012; Accepted 27 October 2012
Academic Editor: Hiroshi Onishi
Copyright © 2012 Ruggero Barni et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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