- About this Journal
- Abstracting and Indexing
- Aims and Scope
- Article Processing Charges
- Articles in Press
- Author Guidelines
- Bibliographic Information
- Citations to this Journal
- Contact Information
- Editorial Board
- Editorial Workflow
- Free eTOC Alerts
- Publication Ethics
- Reviewers Acknowledgment
- Submit a Manuscript
- Subscription Information
- Table of Contents
ElectroComponent Science and Technology
Volume 4 (1977), Issue 3-4, Pages 171-177
doi:10.1155/APEC.4.171
Criteria of Low-Noise Thick-Film Resistors
Eindhoven University of Technology, Department of Electrical Engineering, Eindhoven, The Netherlands
Received 8 June 1977
Copyright © 1977 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
Abstract
Our simple model of the noise of a thick-film resistor leads to two limiting cases. For thick-film resistors with a
conduction dominated by the glass interface, the relative noise is proportional to the sheet resistance, R□. For thick
film resistors, where the conduction is mainly dominated by the current constrictions in the contact areas between
grains, the relative noise is proportional to
The major conclusion is that measurements of the noise index are a nondestructive way to check quantitatively the operations used to manufacture high-quality thick-film resistors. Inadequate materials or treatments, weak or brittle wire bonds and reliability are easily detected by 1/f noise measurements.