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ElectroComponent Science and Technology
Volume 7 (1980), Issue 1-3, Pages 87-91
http://dx.doi.org/10.1155/APEC.7.87

Optimization of Thick Film Resistors for Low Drift

Rifa AB, Spånga, Sweden

Received 26 June 1979

Copyright © 1980 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

In order to minimize drift in a thick film resistor both printing and trimming parameters have to be optimized carefully.

With the aid of a linear theoretical model it is shown how the resistance drift in the bulk transition zone and terminals of the resistor can be calculated for both trimmed and untrimmed resistors.

The theoretical results are used for optimization of laser trimmed high ohmic resistors. The experimental results are in good agreement with the theoretical predictions and confirm that thick film resistors can be optimized for low drift.