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ElectroComponent Science and Technology
Volume 7 (1980), Issue 1-3, Pages 19-22
http://dx.doi.org/10.1155/APEC.7.19

D.C. Sputtering Process: Its Characterization and its Problems When Applied to Tin-Dioxide Thin-Films

Department of Electrical Engineering, University of Pittsburgh, Pittsburgh 15261, PA, USA

Received 11 April 1979

Copyright © 1980 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Anant G. Sabnis, “D.C. Sputtering Process: Its Characterization and its Problems When Applied to Tin-Dioxide Thin-Films,” ElectroComponent Science and Technology, vol. 7, no. 1-3, pp. 19-22, 1980. doi:10.1155/APEC.7.19