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ElectroComponent Science and Technology
Volume 8 (1981), Issue 3-4, Pages 249-249
http://dx.doi.org/10.1155/APEC.8.249
Short Communication

Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering

1Department of Electronic Engineering, Hiroshima Institute of Technology, Hiroshima, Japan
2Department of Electronic Engineering, Tokyo Denki University, Japan

Copyright © 1981 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

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