Research Article

GaN-Based High-k Praseodymium Oxide Gate MISFETs with + UV Interface Treatment Technology

Figure 4

(a) 3d core-level XPS spectra of Pr2O3 versus temperatures. (b) TEM cross-sectional photograph of Pr2O3 MIS-HEMT.
459043.fig.004a
(a)
459043.fig.004b
(b)