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Active and Passive Electronic Components
Volume 2012 (2012), Article ID 729328, 6 pages
http://dx.doi.org/10.1155/2012/729328
Research Article

Gate Stack Engineering and Thermal Treatment on Electrical and Interfacial Properties of Ti/Pt/HfO2/InAs pMOS Capacitors

Department of Electrical Engineering, National Central University, Chungli 32001, Taiwan

Received 16 March 2012; Revised 6 June 2012; Accepted 11 June 2012

Academic Editor: Yeong-Her Wang

Copyright © 2012 Chung-Yen Chien et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Chung-Yen Chien, Jei-Wei Hsu, Pei-Chin Chiu, Jen-Inn Chyi, and Pei-Wen Li, “Gate Stack Engineering and Thermal Treatment on Electrical and Interfacial Properties of Ti/Pt/HfO2/InAs pMOS Capacitors,” Active and Passive Electronic Components, vol. 2012, Article ID 729328, 6 pages, 2012. doi:10.1155/2012/729328