Improved Label-Free LC-MS Analysis by Wavelet-Based Noise Rejection

Table 1

Alignment of technical replicates. Mass Window = 0.2 Th, Scan Window = 250 scans, Min Charge = 2⁺.

		Total	Only I	Only II	Only III	I-II	I-III	II-III	I-II-III
H1 I-II-III	UNPROCESSED	4167	767	568	564	315	288	208	1457
	PROCESSED	5736	1061	915	1018	379	361	338	1664
	% increase	37.65	38.33	61.09	80.50	20.32	25.35	62.50	14.21
H2 I-II-III	UNPROCESSED	4476	890	933	625	208	420	347	1053
	PROCESSED	5783	1178	1307	925	228	519	472	1154
	% increase	29.20	32.36	40.09	48.00	9.62	23.57	36.02	9.59
HDE1 I-II-III	UNPROCESSED	4456	861	889	607	314	475	245	1065
	PROCESSED	6324	1301	1386	1051	384	650	347	1205
	% increase	41.92	51.10	55.91	73.15	22.29	36.84	41.63	13.15
HDE2 I-II-III	UNPROCESSED	3921	842	543	563	345	253	288	1087
	PROCESSED	5087	1068	754	962	356	299	394	1254
	% increase	29.74	26.84	38.86	70.87	3.19	18.18	36.81	15.36